Used NOVELLUS Gamma Express #9171640 for sale

NOVELLUS Gamma Express is an advanced etcher / asher for semiconductor microfabrication. It is designed for high speed, ultra-high accuracy, and excellent coating uniformity. It is widely used in the fab environment for processing semiconductor wafers. Gamma Express is composed of two major components: 1) the condenser, which is a vacuum chamber that contains the etch/ash gas and the substrate; and 2) the electrical delivery system, which is responsible for delivering the output from the source to the substrate. The etch/ash source is an electron beam gun, which generates high-energy ions in order to etch/ash the material. The interaction between the electrons and the gas molecules creates the etch/ashe pattern on the substrate. NOVELLUS Gamma Express provides excellent uniformity for etching/ashing patterns due to its precise control of the beam path. It is equipped with various chucks, collimators, and optical systems to accurately align the substrate and ensure homogeneous etching. The etcher/asher also includes various pulse power supplies and an asynchronous driver for finely controlling process parameters. This can allow for precise control of the etch rate, depth, uniformity, selectivity, etch aspect ratio, and more. Gamma Express is also equipped with several advanced safety features, such as particle detectors, vacuum monitors, and contamination monitors, to ensure that the working environment is safe. Process parameters such as power settings, gas flow, and exhaust pressure can all be monitored in real-time during operation. In terms of sizing, NOVELLUS Gamma Express is quite compact, measuring only 540 mm wide and 515 mm deep. This makes it suitable for medium to large-scale semiconductor processing operations. Gamma Express is also economical, with its competitive price making it a popular choice for many microfabrication processes. Overall, NOVELLUS Gamma Express is an advanced etcher/asher for semiconductor microfabrication, boasting excellent control of the process. Its exceptional accuracy, uniformity, and safety measures make it ideal for semiconductor processing applications.