Used NOVELLUS Gamma Express #9259682 for sale

NOVELLUS Gamma Express is an advanced etcher and asher designed to create multilayered circuit structures for semiconductor devices. It utilizes a continuous deposition and etching process to quickly create complex microstructures with minimal manual intervention. This efficiently enables manufacturers to produce a wide range of components for complex electronic devices. Gamma Express is designed with various capabilities that lead to a user experience that is both efficient and effective. It includes heated plasma, RF, DC power unit, temperature control, and automated substrate loading and unloading systems that simplify and reduce the number of manual steps necessary for etching and ashing. With the variety of options and settings available, manufacturers can precisely control the process of fabrication. NOVELLUS Gamma Express also features an automated wafer alignment system that reduces the need for manual labor and guarantees high accuracy of the etching and ashing process. This system ensures that the pattern and alignment of the substrate is maintained throughout the etching and ashing process, leading to a more consistent results. Apart from the automatic attributes, Gamma Express has an extendable load lock that provides a hermetic atmosphere, enabling etching and ashing of a wide range of materials, and can deposit and etch at temperatures up to 1,500°C. It also has the ability to transfer cleanetch chemicals, which helps with the uniform distribution of chemical opening throughout the entire chamber. Finally, NOVELLUS Gamma Express also includes a steady state operation, which allows for higher substrate deposition rates and a higher yield of electronic devices with fewer defects. This in turn increases the production efficiency and reliability of Gamma Express. In conclusion, NOVELLUS Gamma Express is an advanced etcher and asher that is designed to reduce the manual labor involved in the fabrication of complex electronic components. It features an automated wafer alignment system, heated plasma, RF, DC power units, temperature control, and chemical transportation systems that allow for the precise etching and ashing of multiple materials. It provides a steady-state operation for higher rates of production and higher yields, leading to higher efficiency and reliable results.