Used NOVELLUS Gamma Express #9314670 for sale

NOVELLUS Gamma Express is an etching and ashing equipment designed for both production and development yield enhancement. It is capable of performing dry etching, wet etching, ashing, and iodine stripping in a single system. Gamma Express platform offers plasma compatibility combined with high-precision alignment technology and quick cycle and substrate qualification times. NOVELLUS Gamma Express is designed to deliver a high-quality, repeatable etch process with high throughput. To achieve this it utilizes a advanced optical alignment unit which is capable of precision optical imaging on a variety of substrate materials, including Silicon, Gallium Arsenide, and Silicon Oxide. This allows for quick and accurate etching of small feature sizes and ensures a consistent imaging machine is maintained across the entire etch process. The etched process is conducted using radio frequency (RF) power, supplied by a high-voltage RF power supply. This RF power is used to generate a plasma gas, which is then directed through the etching chamber based on substrate position, material, and etching parameters. This process ensures a uniform etching environment with high levels of dielectric isolation. Gamma Express is also capable of performing wet-etching for applications that require greater levels of removal rate and selectivity. This wet-etched process utilizes a liquid etchant, such as XeF2, combined with an optimized RF pattern that ensures precision etching. This wet-etched process can be used for high aspect ratio features, for example: trenches, vias, and contact holes. In addition to etching and wet-etching, NOVELLUS Gamma Express is capable of ashing and iodine stripping. The ashing process utilizes an oxygen-based gas in order to remove residual photosensitive organic layer material from a wafer surface. Iodine stripping, on the other hand, utilizes a chlorine-bearing gas to remove photoresist that was not completely developed during the lithography process. Overall, Gamma Express is a highly advanced tool that provides precision imaging, high throughput, compatibility with multiple substrates, and fast cycle and substrate qualification times. It is a reliable etching and ashing asset designed to maximize yield enhancement for both production and development applications.