Used NOVELLUS Vector Express AHMxT #9213313 for sale

NOVELLUS Vector Express AHMxT is a dual-chamber etch / asher equipment designed for advanced semiconductor applications such as shallow trench isolation (STI). It provides a highly efficient and cost-effective method for etching/ashing of wires up to 150 nm in feature size. Vector Express AHMxT features two independently-controlled modules, allowing for concurrent etch and asher processes, and an easily-accessible chamber for maintenance and cleaning. The etch chamber of NOVELLUS Vector Express AHMxT is equipped with a high-throughput, multi-frequency plasma generator which can process material layers ranging from 5 to 150 nm in feature size. ALD/CVD-like processes can also be performed when the chamber is equipped with selected precursors. Employing intelligent control logic, the etchant chamber is capable of achieving very high etch rates in a very efficient and cost-effective manner. The asher chamber of Vector Express AHMxT utilizes a source mass spectrometer to provide accurate measurement of process gases and substrate temperatures, as well as improved gas mixing capabilities. The asher is capable of processing materials up to 150 nm in feature size with very precise control. The system is also equipped with a wafer stage loader for easy substrate loading and unloading in applications such as STI and damascene processing. Common applications of NOVELLUS Vector Express AHMxT include: shallow trench isolation (STI), shallow trench isolation (STI), contact holes, gate trenches, vertical and horizontal interconnects, and damascene processing. The unit is able to produce very high etch rates and excellent surface uniformity and cleanliness. In addition, Vector Express AHMxT provides excellent wobble and repeatability, enabling high yields and consistent device characteristics. Overall, NOVELLUS Vector Express AHMxT provides semiconductor manufacturers with a high-performance etch/asher machine for advanced device fabrication and processing applications. Its dual-chamber design allows for concurrent etching and ashing, and its advanced plasma generator and source mass spectrometer provide precise control and excellent repeatability. The tool also offers cost savings due to its high throughput rates and efficient processing.