Used NOVELLUS Vector Express #9125995 for sale
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ID: 9125995
PECVD Systems, 12"
Process: AHM
PECVD (Chemical Vapor Deposition)
Currently in fab
Configuration selections:
Silane Oxide-USG (standard)
Silicon nitride-SiN (standard)
Anti-reflective layer - Pearl
Nitrogen free anti-reflective layer -N- free pearl
Ashable hardmask
Facilities configuration:
Bottom (default)
Remote interconnect cable lengths:
75ft (Default)
Primary user interface location:
Right (default)
Options:
Factory automation communication
Interface (AGV or OHT interface)
Clean room installation kit
High speed spindle
Heated process module manometer
Leak-check shutoff valve for process module
Vector gas box options
(3) Additional gas lines per gas box:
O2 Gas line
CO2 Gas line
C2H2
Customer engineering specials and/or additional items:
CES 4-Light towers (CESCVD04321A)
CES IMM Readiness for 2 FOUP
CES gas box special GIB (CESCVD04339A)
CES gas box safety exhaust Enclos(CESCVD04357)
RF Switch plasma treatment hardware
Hermos ID reader 6M loader (CESCVD04325A)
2005 vintage.
NOVELLUS Vector Express is a high-performance etch and asher equipment that can process a wide range of layer stacks, including many of the new materials used for advanced chip technologies. The system is based on a Dual-Zone architecture, with two independent process zones for etch and asher operations. The dual-zone architecture enables high throughput and flexibility with a single unit, while allowing for a wide range of process options and capability. Vector Express can process up to four substrates at a time, which provides an efficient and reliable platform for high-volume manufacturing. The machine's high-precision tooling can precisely control etch and asher operations while minimizing defects and improving yield. NOVELLUS Vector Express features a high density plasma source, providing excellent uniformity and an industry-leading etch rate. The tool can achieve very low CD uniformity and line width roughness specifications for critical layout features, allowing it to be used for a wide variety of processes, including high-precision patterning of salicides. The asset also includes advanced etch process control features, such as real-time multi-zone vacuum feedback, improved multi-point etch rate control, and integrated vision. These features allow for precise control of product dimensional and composition requirements. Vector Express also features tight temperature control of the plasma chamber, allowing it to process temperature sensitive materials with extremely small or narrow critical dimension features. In addition, the plasma chamber can be heated or cooled, as desired, for various materials or process parameters. NOVELLUS Vector Express is the perfect choice for etch and asher applications that require high throughput and flexibility. It can process a wide range of layer stacks and feature sizes, with tight dimensional control and excellent process uniformity. The integrated advanced process controls and vision systems provide superior product quality, making Vector Express an ideal choice for high-volume etch and asher applications.
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