Used NOVELLUS Vector #167888 for sale

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Manufacturer
NOVELLUS
Model
Vector
ID: 167888
Wafer Size: 12"
Vintage: 2005
System, 12" Dual FOUP Single wafer load locks Wafer centering with OTF Undoped TEOS ILDS Bottom facilities Remote cables: 75ft User interface: Right Heated process chamber manometer Remote clean Dual wavelength end point Aera FC-PA7810C MFCs: He 20L Ar 10L N2 10L C2H2 10L SiH4 500cc SiH4 1.5L CO2 35L N2 35L NH3 20L NF3 10L O2 20L N2O 1.5L N2O 25L High Freq RF generator Low Freq RF generator SEC/GEM HPM detector interface 2005 vintage.
NOVELLUS Vector is an etch/ash equipment designed for use in the electronics industry. It is capable of processing a wide range of materials, including common materials like Aluminum, Copper, Titanium and complex dielectrics such as low-k dielectric materials. Vector is a plasma enhanced chemical vapor deposition (PECVD) based machine, which means that it uses high temperature ions of reactive gases to deposit dielectric and metal layers onto a substrate. This process is repeated while the substrate is moved relative to the ion source, resulting in complex patterns of metal and dielectric deposition with precise topographies. NOVELLUS Vector is capable of etching up to 500-Micrometers deep in metals and 200-micrometers in non-metallic materials. It boasts a unique feature in its glass-vacuum chamber which provides superior uniformity, uniform etch depths, and excellent machining rates. Vector features software enhanced arcing for improved process control and repeatability as well as an automated tool controlled by a graphical user interface. This software allows for adjustments of pressure and temperature for specific applications, and there are pre-defined etch processes that can be set and called up for routine jobs. NOVELLUS Vector also features a gas shutoff valve to quickly shut off the etch process, and a low-vibration environment that reduces micro-etching and pattern deformation. This allows for improved etch rates, uniformity and accuracy. Vector incorporates a multi-ION source and a robotic substrate handler, allowing it to process up to 3 substrates at once. It also has a multi-chamber capability, allowing users to etch and asher in different vacuum chambers. NOVELLUS Vector is capable of handling a variety of substrates, including wafers, metal, and glass. Vector also incorporates wafer flatness control and a foreign particle inspection system that identifies foreign particles and rejects processed substrates when necessary, assuring users the highest yield environment. NOVELLUS Vector's temperature control zone and process gas management provide a stable plasma environment and excellent etch/ash characteristics. An additional chemical bath can also be used for additional etching and ash operations. Vector is an advanced etch/ash unit designed for the electronics industry, offering users a wide range of features that are designed to provide superior process control and repeatability for a variety of materials. Its multi-chamber ability, software-enhanced arc control, and foreign particle inspection machine provide users with a powerful and reliable tool for their etch/ash needs.
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