Used NOVELLUS Vector #9167159 for sale
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ID: 9167159
Wafer Size: 12"
Vintage: 2005
CVD Systems, 12"
Currently warehoused
2005 vintage.
NOVELLUS Vector is a high-precision etcher/asher designed for precision etching, ashing, and material surface removal applications. Vector combines two equipment platforms in one tool - an etching equipment and an ashing system - allowing users to process materials such as Si, GaAs, quartz, and glass with single-step results. NOVELLUS Vector also utilizes advanced etching technology, providing increased levels of precision and control. Vector is ideal for etched profiles that have high aspect ratios, tight-tolerance pattern repeatability, and high-etch selectivity. It can process a variety of wafer sizes, including 4", 6", and 8". NOVELLUS Vector also has features that make it well suited to advanced patterning applications, such as micromachining, microfabrication, integrated circuit fabrication, and deposition/etching of metals and dielectrics. Vector uses DirectedCathodne Beam technology (DCB) to ensure high etch rates and optimal material selectivity. DCB technology also ensures a precise, uniform, and highly repeatable pattern profile. NOVELLUS Vector users can adjust their etch process parameters and process flow to produce uniform features that work in conjunction with other etch components. Vector is equipped with several safety features, such as a shielded chemical delivery unit that contains and quarantines corrosive and hazardous materials, and a secure environment for dielectric and metallic etching materials. The machine also incorporates a laser cooling tool for the protection of the process chamber and the wafers. NOVELLUS Vector is an ideal tool for etching applications, with advanced control, repeatability and precision. It is highly reliable, requiring minimal maintenance and produces consistent process results. Its reliable process stability leads to increased throughput rate and cost savings. Vector also offers a unique blend of flexibility and usability, allowing users to optimize their process parameters and process flow to meet their requirements.
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