Used NSC ES 371 #9144811 for sale

NSC ES 371 is an etcher/asher equipment designed for use in semiconductor fabrication. It utilizes plasma etching technology to quickly and accurately create high-precision patterns on a variety of substrates. This system features a Vacuum electron beam that processes substrates up to 150mm in both planar and 3D formats. It offers high uniformity and high yield, allowing for precise etching results. ES 371 is built with a modular design to facilitate easy maintenance and upgrades. It offers a range of process methods including RIE (Reactive Ion Etch), ICP (Inductively Coupled Plasma), and IBI (Ion Beam Inducement). These implementations offer enhanced process control over a wide range of temperatures and gas mixtures. The unit's built-in auto-tune and feedback machine allows for ultra-precise process tuning and control, contributing to maximum etching efficiency. This tool's operating temperature range is flexible, with standard operating temperatures ranging from ambient to 300°C. This temperature can be adjusted to accommodate various types of substrates. Additionally, different types of sublimation can also be performed on NSC ES 371, making it an ideal platform for multiple etching applications. ES 371 is equipped with a variety of safety features that are intended to protect both the user and the asset itself. This includes an overload protection function, which continuously monitors the model for abnormal current and voltage levels. Additionally, the equipment is designed with a water leak detection system that can detect instances of leakages within the unit, allowing for timely repair and maintenance. Overall, NSC ES 371 is a versatile etching/ashing machine capable of meeting the needs of highly precise applications. Its temperature and process control capabilities, along with robust safety features, make it an ideal choice for semiconductor and related industry applications.