Used OCCLEPPO 650-97-P-150 #193947 for sale
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OCCLEPPO 650-97-P-150 is a batch-type etcher/asher designed for the etching and ashing process of a wide range of semiconductors. It is comprised of a double-walled stainless steel based construction, which incorporates several advanced features to enable repeatable and exacting processes for microlithography applications. Its base is designed to provide a low pressure, uniform temperature and uniform gas flow, while its chamber walls are fitted with primary and secondary heaters as well as a high velocity burner. This allows for exact process control of the materials heated. Additionally, 650-97-P-150 is designed with a high visibility quartz window for process monitoring. This equipment is integrated with a comprehensive set of valves, flow controllers, and gas mixing tools that allow for easy process setup and control. Its large, programmable touch screen allows for easy setup and control of all gas flows, temperatures, and times. The built-in auto tune and data logging features make process monitoring and control incredibly precise. Furthermore, OCCLEPPO 650-97-P-150 system comes with a high precision alternative to the manual valve unit, which includes a two curt pumps and a pressure regulator. This makes it much easier to regulate gas flows and pressures for more precise processes. In addition 650-97-P-150 comes with safety features to protect operators and the environment during processes. It includes a dual vacuum machine and air filter tool for process protection to ensure that no gasses or chemicals escape the asset. Other safety and process control features include a halocarbon leak detector, process gas purification model, and air filtration equipment. Overall, OCCLEPPO 650-97-P-150 is an advanced etcher/asher designed to meet the highest standards of process precision and safety. It is designed for use with a wide range of semiconductor substrates and features comprehensive process control and system management features. The Etcher/Asher is an ideal choice for ultra-high precision processes.
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