Used OXFORD 100 ICP 380 #293640839 for sale

OXFORD 100 ICP 380 is an etcher / asher, which is used to produce volatile semiconductor components. It can be used to create basic through-hole and surface mount components, such as annealed beads, bond wire, passives, and thru-hole interconnects. The ICP 380 uses induction coupled plasma etching (ICP) to rapidly etch away unwanted material. Induction coupled plasma etching works by creating a high intensity plasma field within a vacuum chamber. This field excites electrons in the atoms of the unwanted material, causing them to crash into each other, breaking down the material into its smallest possible form, so that it easily vaporizes or is swept away by the vacuum. The ICP 380 combines rapid etching speeds with a high degree of precision due to its induction coupled plasma technique. In addition to etching components, the ICP 380 is also able to perform ashing, which is a process by which potentially hazardous semi-conducting materials can be safely and efficiently removed. Ashing is important for pre-cleaning components or removing photoresists before proceeding with plating or other processes. The ICP 380 offers an exceptional level of accuracy and flexibility, as the process parameters and cycle times can be customized to match the requirements of any particular application. It can also support a wide range of materials, including organic and metallic substrates, as well as precious metals. Furthermore, it has compatibility with most popular programmable logic controllers, so it can be integrated with existing systems and processes. 100 ICP 380 etcher / asher is a highly versatile and powerful tool for the manufacture of semiconductor components. Its ability to etch and ash at high speeds with high precision make it an invaluable asset in the production of a wide range of through-hole, surface mount, and chemical-mechanical processes. It is able to work with a variety of materials and is designed to be easily integrated into existing processes for maximum efficiency and performance.