Used OXFORD 100 PLUS #9296251 for sale

OXFORD 100 PLUS
Manufacturer
OXFORD
Model
100 PLUS
ID: 9296251
Wafer Size: 8"
Reactive Ion Etcher (RIE) system, 8".
OXFORD 100 PLUS is an etcher / asher purpose-built for research and production applications. It is designed to provide reliable results in a wide variety of applications. The system features a powerful and versatile RF power supply, high-resolution microcomputer controller and a range of advanced technologies. 100 PLUS boasts an easy-to-use control interface with intuitive graphical display. It allows users to select the desired parameters, configure the specific requirements, and set-up recipes. The unit includes a shuttle type power transducer with the ability to deliver up to 200 watts of RF power, enabling effective etching/ashing with high-precision. OXFORD 100 PLUS offers exceptional resolution and accuracy with excellent long-term stability. It provides excellent uniformity of etching across the entire substrate, and a wide range of process parameters. The unit also offers superior process speed, and supports the use of etching masks for feature-rich designs. 100 PLUS utilizes advanced high current discharge technology to achieve precise etching while at the same time reducing the number of by-products generated as a result of the process. Additionally, the unit utilizes high-resolution feedforward technology to ensure that the time used in etching is optimized, reducing the production cycle time. The overall design and construction of OXFORD 100 PLUS has been built with focus on ease of use and reliability. The construction of the unit is optimized to ensure maximum functionality, and all wiring and connections have been carefully tested for stability. Finally, the advanced graphical user interface allows the user to customize the unit for their specific requirements. In conclusion, 100 PLUS is a top-of-the-line etcher/asher that is reliable and accurate, and designed to provide excellent results for research and production applications. Its advanced technologies enable maximum etching capabilities and reduction in process time, while maintaining high levels of accuracy and long-term reliability.
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