Used OXFORD 80 #9140533 for sale

OXFORD 80 is a multi-level high-speed etcher / asher with excellent precision and control. It is a complete equipment manufactured by OXFORD Instruments and designed for dry etching and ashing of semiconductor wafers in production and research environments. The system's design and features make it an ideal choice for advanced thin film etching and ashing applications, with its variable pressure and turbo pump ensuring a controlled etching process. Its advanced design enables it to limit chemical usage to the minimum, which is beneficial for both cost and environmental impact. 80 has three process chambers - the etch chamber, etch chamber focus and the asher chamber - each with individual gas and pressure control. The etch chamber is equipped with an integrated pressure control valve and pressure gauge, allowing for both constant and pulsed pressure processes, as well as an automated safety cut-off unit which is triggered when low pressure is detected. The etch chamber focus also offers integrated pressure control, allowing for low processing pressure and improved control when etching delicate structures. The asher chamber is equipped with a turbo pump and variable pressure valve for excellent control when using a variety of chemistries. OXFORD 80 is highly compatible in terms of process chemistry, with the ability to etch and ash a vast range of materials. Its precision and process control allows for accurate repeatability, and removable gas supply lines and rotatable exhaust wings make it easy to configure for a range of etching chemistries. The machine is extremely durable, with a variety of features helping it to stand up to lengthy production runs. It is extremely user-friendly, with a straightforward digital control display helping to keep downtime to a minimum and providing a detailed overview of the process. In summary, 80 is an excellent choice for dry etching and ashing of semiconductor wafers. Its precision, durability and control make it a perfect fit for production and research environments, and its ease of use and compatibility help to minimize downtime and maximize production efficiency.