Used OXFORD 80 #9153430 for sale

OXFORD 80 is an advanced etching and ashing machine designed for use in laboratories. It is capable of a variety of etching and ashing applications, including of gates, damage structures, contact holes, doping surfaces, and oxide layers. The machine is versatile, making it suitable for a wide range of substrates and materials. 80 etcher / asher is fully automatic, providing consistent results regardless of the user's skill level. It can specify the type of etching / ashing task, the etching direction, and the number of times the task is to be repeated. The machine's user interface is highly intuitive, allowing precise control of etching and ashing parameters. OXFORD 80 etcher / asher is capable of executing etching and ashing procedures on layers of silicon wafers or other microstructured materials. It can process both a single or multiple layers, and supports features such as low voltage bias and multi-mask alignment. Additionally, it utilizes particle-free gas sources to minimize contamination or damage to the substrate. 80 etcher / asher is highly reliable and offers superior process reproducibility with a high throughput. It is equipped with a unique nozzle design and incorporates noise reduction features to minimize noise pollution in laboratory environments. The machine's maintenance is simplified with visual indicators that alert technicians to potential problems, as well as on-board diagnostics for troubleshooting purposes. To ensure consistency with the various substrates it can work with, it also contains a temperature monitoring system to ensure that the temperatures for each substrate type are regulated according to the desired specification. OXFORD 80 etcher / asher is capable of etching and ashing with a variety of gases, as well as controllable gas flows and RF power levels. It also supports multiple wafers at different temperatures, which makes it a suitable tool for testing new materials or devices. Overall, 80 etcher / asher is an efficient and reliable machine for etching and ashing tasks. It is suitable for a wide range of substrates and materials, and is capable of precise processing with high throughput. It offers superior process reproducibility, and intuitive user interface which makes it a great choice for any laboratory.