Used OXFORD 90 Plus #9060476 for sale

OXFORD 90 Plus is an advanced etcher/asher designed for nanostructuring and direct write etching applications. It is designed to achieve extremely high levels of accuracy and precision for ultra-fine etching of metal and non-metallic substrates. It is equipped with several unique features that make it highly suitable for applications like MEMS fabrication, microfluidics, and high-performance PCBs. 90 Plus employs a state-of-the-art pulse generator and digital power control unit to ensure highly accurate and precise etching. It is designed to operate with two common modes: LID (Laser Induced Direct Etching), and OHE (Optically Assisted Etching), which can be used to etch metals as well as non-metallic materials like polymers, semiconductors and dielectrics. The OHE mode offers considerably higher levels of accuracy and repeatability as compared to conventional etching techniques. The core of OXFORD 90 Plus is its direct-write laser etching system, which uses UV lasers to etch patterns directly onto the substrate. The laser's focus spot is very small and the system offers precision down to 1 to 3 nanometers. This level of accuracy is ideal for creating nanoscale structures on metals and some non-metallic materials. 90 Plus is also equipped with several other features that increase its flexibility and user-friendliness. It offers a modular design, 4-axis scanning capability and a built-in wafer handling system for increased throughput. It also features full computer control, enabling users to quickly and easily create custom etching patterns and manage process settings remotely. OXFORD 90 Plus has been extensively tested and validated in various etching applications, making it a reliable and versatile choice for a variety of micro-fabrication tasks. It's highly accurate etching and precise wafer handling capabilities make it an ideal choice for microfluidics, MEMS and high-performance PCBs. Its modular design and computer control capabilities make it suitable for high-throughput production processes, and its laser-focused precision etching makes it ideal for nanoscale etching applications.