Used OXFORD ICP 100 #293655612 for sale

OXFORD ICP 100 is a fully automated, precision etcher/asher designed to produce quality micro patterns, circuit boards and other planar micro-scale structures. It can etch with up to three different gas mixtures and up to 10 independent gas components, allowing precise control of the etch process. The software-driven process enables the user to set up a variety of parameters, including etch rate, temperature, pressure, and time. The equipment is capable of controlling the pressure of the process gases and the laser intensity to a high degree of accuracy, enabling precise etching of micro patterns. ICP 100 includes an integrated computer control unit, a pneumatically operated vacuum chamber, and a manual valve control unit. The vacuum chamber is equipped with diffusion pumps, baffles, and a vacuum gauge to ensure uniform etch processing of even the smallest feature sizes. The built-in, gas-pressure monitoring system allows the user to set gas pressures with accuracy. OXFORD ICP 100's etch chamber is heated with a specially designed hearth that is designed to resist etching wear during processing. The main chamber temperature is adjustable to maximize process uniformity and control etch rate. The unit is also equipped with an etch platen that has been designed to withstand the high temperatures and pressures that occur during the etching process. The laser source in ICP 100 is designed to contribute to the high level of control and accuracy the machine offers. It uses two different wavelengths - a violet 450nm and a green 532nm - to optimize process uniformity and enable fine-grained control of the etching parameters. In addition, the laser is driven by a shutter tool, further ensuring uniform etch processing. Overall, the laser source of OXFORD ICP 100 has the ability to etch on an accurate 150dpmm etched pattern with minimal level of undercut. ICP 100 also includes a powerful computer interface. This user-friendly software allows the user to program, monitor and relay all necessary parameters to the process controller. In addition, the asset offers a range of parameters and settings that can be changed, including etching pressure, temperature, and time. The software also provides a programmable dithering feature which increases the etching resolution to up to 200 dpi. OXFORD ICP 100 is suitable for a range of applications, including the production of micro-electronics and circuit boards. Its accuracy, speed and repeatability makes it the ideal tool for etching on substrates with surfaces as small as 0.2 mm. ICP 100 is an ideal choice for precision etching applications.