Used OXFORD INSTRUMENTS Plasmalab 800 Plus #293586570 for sale

OXFORD INSTRUMENTS Plasmalab 800 Plus is a powerful plasma etcher and asher designed for a wide range of research and production applications. It utilizes multiple gas delivery systems to provide a flexible, highly-controlled etching process, suitable for both wet and dry etching. It is designed to consistently deliver precise, high-quality results in the shortest possible time. Plasmalab 800 Plus is suitable for a variety of substrates, including Silicon, Glass, Ceramics, Silicon Carbide, and Polymer materials. The system also supports plasma etching of metals and other material types. The etcher offers impressive degree of control and scalability, which allows optimal management of different etching stages for different etching requirements. OXFORD INSTRUMENTS Plasmalab 800 Plus features a wide range of advanced etching tools, such as a Plasma Source Actuator (PSA), a endo-thermal etching station with DC bias, pre-programmed stage movements, a VCR interface for fine tuning of timing sequences, an interface for remote control, an optional PC-controlled monitoring system, and an Active Gas Leak Detector. Moreover, the system is capable of both low-pressure and high-pressure etching, providing users with fine control over process parameters. The user-friendly software interface of Plasmalab 800 Plus features a wealth of features, such as a pre-programmed Timer, recipe control, and periodic process control. This allows for full repeatability of the etching process, allowing users to achieve consistent results with greater efficiency. Additionally, OXFORD INSTRUMENTS Plasmalab 800 Plus offers extensive process monitoring, including temperature and pressure readings from each individual tool, as well as feedback from the Plasma Source Actuator (PSA). Furthermore, Plasmalab 800 Plus features an innovative, modular design which allows additional hardware upgrades to expand its capabilities. Ultimately, OXFORD INSTRUMENTS Plasmalab 800 Plus offers a state-of-the-art etching solution which can easily be adapted to meet the needs of various research and production applications.