Used OXFORD OD 2775/00 #293746843 for sale

OXFORD OD 2775/00 is a highly advanced and versatile etcher/asher equipment designed for precise and uniform processing of various materials used in microelectronics, semiconductor, photonics, and other industries. This cutting-edge equipment is equipped with advanced features and capabilities to meet the demanding requirements of modern fabrication processes. OXFORD OD 2775/00 features a robust construction and a compact design, making it suitable for use in cleanroom environments with limited space. The system is equipped with a range of safety features to ensure operator protection and to minimize the risk of accidental exposure to hazardous chemicals or materials. One of the key features of OXFORD OD 2775/00 is its precision control capabilities, which allow for the accurate etching and ashing of various materials with high repeatability and consistency. The unit is equipped with advanced process control software that enables users to define and optimize process parameters to achieve the desired results. This software also allows for real-time monitoring and adjustment of process parameters to ensure optimal performance. OXFORD OD 2775/00 is equipped with a high-performance plasma source that enables rapid and efficient processing of materials. The plasma source generates a highly reactive ionized gas that is used to etch or ash the material surface with high precision and uniformity. The machine is also equipped with a high-capacity vacuum pump tool that ensures rapid evacuation of process gases and efficient removal of by-products from the processing chamber. OXFORD OD 2775/00 features a versatile process chamber that can accommodate a wide range of substrate sizes and shapes. The chamber is equipped with a state-of-the-art heating and cooling asset that allows for precise control of process temperatures to optimize etching and ashing processes. The model also features a multi-gas delivery equipment that enables users to select and control the flow rates of various process gases used in the etching and ashing processes. OXFORD OD 2775/00 is equipped with advanced automation capabilities that allow for high-throughput processing of multiple substrates in a single run. The system features a robotic substrate handler that enables seamless loading and unloading of substrates, minimizing downtime and increasing overall productivity. The automation capabilities of the unit also allow for batch processing of substrates, further enhancing process efficiency. In conclusion, OXFORD OD 2775/00 is a state-of-the-art etcher/asher machine that offers high precision, versatility, and efficiency for a wide range of applications in the microelectronics and semiconductor industries. With its advanced features and capabilities, this tool is well-suited for demanding fabrication processes that require precise and uniform etching and ashing of materials.