Used OXFORD Plasmalab 100-ICP 180 #293765810 for sale

OXFORD Plasmalab 100-ICP 180 is an etching / asher equipment designed to provide high resolution, repeatable, and reliable processing of a wide range of materials. It is a single wafer, dual pocket system with a maximum substrate size of 200mm (8") and a minimum substrate size of 150mm (6"). It utilizes inductively coupled plasma (ICP) source technology for advanced etching / ashing techniques and is capable of achieving etch rates up to 100 nanometres per minute. The core of the unit consists of an advanced gas delivery machine, an inductively coupled ICP plasma source, powerful RF generator, vacuum pump, and control unit. The tool is designed to allow the easy integration of multiple processes such as photoresist strip, etching, ashing and more. The dual pocket design allows users to quickly swap chambers for different processes as well as support double sided processing. In addition, the asset supports a wide range of gases and their corresponding processes including Ar, F2, O2, CF4, CHF3, SF6, and more. The model also offers process control and repeatability through advanced plasma control techniques. OXFORD PLASMALAB 100 / ICP 180 has advanced temperature control for both chambers, which allows users to maintain a stable temperature throughout the etching / ashing process. The equipment also offers programmable gas flow settings and enables the user to set and tune the process parameters more precisely than ever before. The system is fully automated and is controlled via a user-friendly, touchscreen interface. It offers built-in software packages designed for ease of use and reliable performance. The unit can also be integrated with existing manufacturing systems and networks for a dependable, efficient process. Plasmalab 100-ICP 180 is ideal for use in semiconductor, consumer electronics, solar, and MEMS manufacturing. It is highly reliable and offers the highest level of control for advanced processes. With its advanced technology, exceptional temperature control, and strong process repeatability, PLASMALAB 100 / ICP 180 is an excellent choice for advanced etching / ashing processes in high resolution applications.