Used OXFORD Plasmalab 100 ICP #293663032 for sale

OXFORD Plasmalab 100 ICP is a versatile etching and ashing equipment for use in semiconductor fabrication applications. It is renowned for its reliable performance, cost effectiveness and simple operation. The system features a dual chamber design to allow for parallel processing of materials to shorten processing times. The unit includes a hydrocarbon etching chamber and a clean-dry ashing chamber. The hydrocarbon etching chamber is designed to accommodate a range of substrates including metal depositions, polysilicon and glass. It offers a maximum temperature of 500°C and is compatible with various gaseous mediums including HF, HCL, Ar, and O2. The hydrocarbon etching chamber in the machine provides good selectivity and surface profile control for etching processes. The clean-dry ashing tool features a quartz tube configuration and integrated RF plasma source. This chamber operates at 500°C and allows for high-rate deposition of polysilicon layers, silicon oxides, and glass. The asset also has a built-in plasma controller for efficient and precise control of process parameters. Plasmalab 100 ICP offers a simplified and user-friendly interface for operation and process monitoring. It has been designed for easy integration in existing fabrication processes, with a range of recipes and user-definable working parameters to enhance productivity. The model also offers advanced monitoring capabilities, including fault diagnostics, detection of process abnormalities, and automatic recipe control. Furthermore, the Oxfod OXFORD Plasmalab 100 ICP incorporates the latest in printing and digital image capture technologies to enable the printing and viewing of wafer patterns. Plasmalab 100 ICP is an advanced equipment designed for high-performance and precise control of etching and ashing processes. Its intuitive software allows for quick and easy operation and its robust design ensures long-term serviceable operation. This highly reliable system is suitable for medium and large scale semiconductor fabrication applications and is an ideal choice for labs and research centers.