Used OXFORD Plasmalab 100 #293587250 for sale

OXFORD Plasmalab 100 is an etcher and asher designed for use in a wide range of etching applications. This equipment is designed to be reliable, robust, and versatile, and uses a DC coupled, low-pressure and higher pressure magnetically-enhanced, inductively coupled-plasma (ICP) to etch metal and dielectric layers for electronic devices and related applications. The etching and ashing process uses a strip of target material, typically metal or dielectric, as the substrate to be etched, and a series of precision-controlled pulses to etch the material into shapes and patterns. The main components of Plasmalab 100 include a plasma source, a chamber, a controller, and a vacuum pumping system. The plasma source is a combination of low pressure and high-pressure capacitively coupled direct current (CC-DC), allowing the unit to provide a stable and highly uniform plasma. This provides the highest quality etching and ashing results. The chamber consists of an antechamber and a process chamber, with the process chamber featuring a matched inductive coil to enable precise timing of the pulsing for etching/ashing. The controller is responsible for controlling the parameters of the plasma, as well as monitoring and controlling pressure levels. The vacuum pumping machine ensures low levels of pressure in the chamber, and can be adjusted to meet the requirements of a particular application. OXFORD Plasmalab 100 is a robust and reliable tool, able to work with a variety of metals and alloys, as well as high-k dielectric materials. The asset offers adjustable and repeatable etch rates, enabling precise repeatable results and process optimization. The model is suitable for a wide range of etching applications, including 3D stacked chip packaging and MEMS fabrication, as well as microelectronics, integrated circuit (IC) packaging, wafer dicing, and optical manufacturing. In addition, the equipment is capable of handling fragile materials such as polymer, quartz, and thin films. Plasmalab 100 is a reliable and robust etcher and asher, capable of etching a wide range of materials to meet the demands of many etching applications. The system features precise and repeatable etch rates and adjustable pressure levels, enabling precise results that are repeatable. This unit is ideal for use in IC packaging, MEMS fabrication and wafer dicing, as well as in other markets and applications.