Used OXFORD Plasmalab 100 #293592017 for sale

OXFORD Plasmalab 100 is a plasma etching and ashing tool designed to clean and etch a wide range of materials. It is a high-end, cost-effective solution for biological, microelectronic and semiconductor research and development projects. The high-force DC plasma etching and ashing tool uses a heated, driven torch discharge to chemically etch and clean materials. Plasmalab 100, a high-capacity equipment, alloys any gas combination, making it highly-versatile and suitable for processing fragile and sensitive substrates, such as palladium and thin-film substrates. The system is equipped with advanced touchscreen display, allowing users to adjust settings to obtain their desired etch results. OXFORD Plasmalab 100 offers excellent repeatability, minimizing the amount of post-processing that needs to be done to achieve the desired surface finish. It can also be used for more intricate plasma etching tasks, such as etching of nanopatterns, deep etching and shallow trenches. Plasmalab 100 unit also features a precision dosing machine, which allows for fine to coarse materials to be processed. This is backed up by the versatile and user-friendly touch-screen panel that allows users to quickly adjust process parameters. OXFORD Plasmalab 100 comes with a full user manual and training video to help the user become familiar with its settings and functions. Plasmalab 100 is designed for the processing of a wide range of materials, including but not limited to: a) harder substrate materials like silicon, ceramics, metals, nitrides, and refractory metals; b) less process-resistant materials like plastic, glass, and softer metals; and c) thin film materials such as TO-5, flat-panel displays, and printed circuit boards with advanced process control in chamber. Overall, OXFORD Plasmalab 100 is a highly accessible, cost-effective, precise, and high-capacity plasma etching and ashing tool that is easy to use and highly reliable. It is suitable for any application requiring a precise and reliable plasma etching process, leaving a clean and precise finish.