Used OXFORD Plasmalab 100 #293641059 for sale

OXFORD Plasmalab 100 is a highly-engineered, precision etcher and asher. This all-in-one equipment was designed for universities and research facilities requiring rapid turnarounds for semiconductor and microelectronics applications. The device integrates a plasma source with a 6 in. etch and asher chamber. The chamber is designed to perform both etch and ashing operations that require a high degree of control in order to achieve the required surface quality. The device utilizes a low-pressure inductively coupled plasma (ICP) source. This plasma source is capable of providing an extremely clean and homogeneous plasma environment for rapid turnarounds. Its inductively coupled plasma (ICP) discharge offers outstanding performance in terms of yield and precision. The vacuum chamber has a T-shaped layout to provide a wide range of etch and ashing options. The vertical T-assembly offers a high degree of control during etching and ashing. The user can adjust the angle and speed of the plasma discharge, as well as the gas pressure perfluorocarbon (C4F8) to achieve the desired surface finish. The entire system is built with careful attention to detail for superior performance. Every component of the unit is constructed from ultra-high purity materials. The chamber is easy to load and unload, with a pneumatically actuated door, and offers user-friendly controls through the integrated graphical user interface. Plasmalab 100 etcher and asher offers both repeatability and reliability. Its advanced thermal management machine guarantees uniform and consistent conditions, while the internally managed safety tool ensures operator safety with reliable and comprehensive safety measures. In conclusion, OXFORD Plasmalab 100 provides a reliable and efficient etching and ashing solution for any application. It is easy to operate, has a high degree of precision and repeatability, and offers superior performance.