Used OXFORD Plasmalab 100 #293656747 for sale

ID: 293656747
Wafer Size: 8"
PECVD System, 8" Process: SiN.
OXFORD Plasmalab 100 is an etcher/developer that is designed for use with a broad range of vacuum thin film deposition processes. The unit features a compact and durable design, allowing it to be used in many industrial and laboratory settings. Plasmalab 100 is equipped with a range of advanced technology components, allowing it to etch and deposit a wide variety of materials. This includes thin film silicon oxide, nitride, aluminum, titanium, tungsten, and various metals, alloys, and oxides. The unit features a self-contained chamber with an integrated pump for pumping all necessary gases and creating the required vacuum pressure. Its sealed chamber design ensures that there is a steady supply of clean gas to the deposition chamber, allowing for precise and reliable etching and deposition of materials. An integrated, programmable pressure controller automatically adjusts the pressure in the chamber for optimal etching performance. OXFORD Plasmalab 100 is equipped with a massive 4 kW electrical power supply, which is capable of providing the necessary power to drive a wide range of etch recipes, from low to high current density processes. An adjustable ion source allows the user to tailor the ion beam to the material being etched or developed. This includes the ability to adjust the energy and current density, as well as the spot size, which are both important parameters for etching uniform features of the same size and depth. The unit also features medium- and low-pressure settings, which should be adjusted by the user depending on the type of material and depths of the etch necessary. On-board diagnostics display the gas flow, chamber pressure, ion beam parameters, and more during etching in real time. This allows for full control and monitoring of the etch process. Plasmalab 100 is a reliable and robust unit that is easy to install and use. Its simple user control panel allows for quick access to all the necessary tools, which can be tailored to specific etching needs. At the same time, it features advanced safety control mechanisms to ensure that hazardous materials, such as flammable gases, are used safely and responsibly.
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