Used OXFORD Plasmalab 100 #293660206 for sale
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ID: 293660206
Vintage: 2005
System
With ICP 180
Gases: C4F8, CHF3, SF6
2005 vintage.
OXFORD Plasmalab 100 is an etcher / asher designed for precision plasma etching, allowing high etching speeds and uniform etch profiles while also providing high energy efficiency and fast sample processing. This equipment includes a user-friendly tabletop vacuum chamber with advanced vacuum technology, high-precision chuck and electrodes, and an application-specific software package for precise etching of different materials to a variety of depths. Using the system's homogeneous reactor, researchers can uniformly etch substrates without sample shifting or damage. High etching rates combined with a high-precision chuck and electrode assembly enable users to accurately etch a wide range of materials with high-fidelity, reproducible etch profiles. Additionally, Plasmalab 100 provides uniform etching depth and endpoint detection via a unique gas delivery platter that evenly distributes reactive gases across the substrate for high etching rate uniformity. The unit's advanced vacuum technology also allows for an ultra-low pressure regime for high-resolution etching of sub-micron trenches and other microfabricated structures with feature sizes down to 50nm. This ensures a dry etching process that produces low-temperature profiles, enabling practical etching of advanced devices with a minimal risk of delamination or breakage due to thermal stresses. The included software package offers extensive application programmability with peak optimization, substrate pattern recognition, endpoint detection, multi-axis control, and many more control options to ensure accurate and reliable etching results. Additionally, an adaptive self-learning etch process can be configured to continuously vary etching conditions for optimum etch rate and profile control. Advanced data logging functions also allow for easy monitoring and display of process parameters, time-of-day, durability, and other vital metrics. OXFORD Plasmalab 100 is an ideal solution for etching of thin films, MEMS devices, and MEMS components. With its high level of accuracy, repeatability, and functionality, it provides clean, reproducible etch profiles with minimal risk of sample shift or damage. This machine is ideal for researchers researching advanced MEMS structures, who require fast, uniform, and reliable etching.
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