Used OXFORD Plasmalab 100 #293743445 for sale
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ID: 293743445
Wafer Size: 6"
System, 6"
(2) Process modules
Quartz clamp, 6"
PECVD Left chamber
ICP/RIE Right chamber with turbo
Endpoint detector laser
Square loadlock with rotating arm
PLC Controller
(3) Oil pumps
Chiller
PC
PECVD Gas pod: SiH4 (Silane), N2O and NH3 (Ammonia)
ICP/ RIE Gas pod: C4F8, O2 and He
Operating system: Windows 2000.
OXFORD Plasmalab 100 is a highly advanced etcher / asher ideal for a broad range of research and industrial applications. With its advanced technology, this equipment offers precise and precise etching and ashing capabilities for research and development laboratories. This etcher / asher has a powerful 200-watt RF generator, enabling to achieve high etch and ash rates. Its fully integrated, easy to use control software allows easy selection of etch and ash parameters. Furthermore, the systemfeatures a large and intuitive full-color 16-inch touchscreen display which allows the user to easily control and monitor the progress of the etching and ashing process. Plasmalab 100 also offers a variety of etching and ashing options. It supports a wide range of substrate materials, and its robust platform makes it ideal for higher power applications. It can also be used to etch patterned substrates, including wafers, die and ceramic substrates, and can generate a range of feature sizes and depths. This makes it suitable for a variety of industrial, microelectronic, semiconductor, and biological research applications. This system offers a variety of process-controlling capabilities to ensure absolutely repeatable and reproducible results. It offers both manual and automated etch and ash control, allowing for precise control of the etch and ash rates. Furthermore, it has a unique Turbulent Ionized Plasma (TIP) source which provides a rapid response when the process parameters are changed, resulting in a very homogenous plasma throughout the unit chamber. It also features a gas shower which helps ensure uniform gas distribution and can reduce particle formation. OXFORD Plasmalab 100 also features a dual cooled platen, enabling efficient removal of heat generated during the etching and ashing process. For extremely high etch or ash rates, it offers a fast cooling machine, as well as an upgraded cooling component which increases the cooling capacity up to 80%. Its advanced safety features include a safety enclosure and an emergency stop switch. It is CE certified, and is available in two different models - one for industrial use and the other for laboratory use. Finally, it comes with a two-year warranty which covers the parts, labor and travel costs.
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