Used OXFORD Plasmalab 100 #293748565 for sale

OXFORD Plasmalab 100 is a plasma etcher / asher designed to deliver controllable and repeatable etching and ashing capabilities in a broad range of applications. With its patented 'Slotted Liner' design, the equipment incorporates a range of components to mitigate contamination and provide high-speed processing. Designed for use in R&D and production settings, Plasmalab 100 is equipped with a single Substrate Holder, allowing it to process up to seventy-five (75) 150mm wafers or 145 mm wafers. It also includes a single 8" RF coil, enabling it to etch substrates up to 500um thickness. The Substrate power source can supply up to 1.2kW of power with a maximum standing wave ratio (SWR) of 1.4, for efficient and repeatable processing. OXFORD Plasmalab 100 also features a Hi-Vision high resolution flat panel monitor with a crisp 5 megapixel resolution. This allows users to display real-time, high-definition streaming images of the wafer/substrates inside the etcher/asher. Furthermore, a programmable logic controller (PLC) is incorporated into the system to monitor and control processes such as pressure, temperature and RF power settings. Plasmalab 100 also has several safety and contamination prevention mechanisms to ensure optimal results. It's equipped with a five stage dust filter, as well as a self-check unit to prevent any residue particulates from entering the maintenance access door seal. The machine also uses inert gases and active shielding to prevent any electrically conductive particles from entering the chamber, thus preventing plasma breakdown and equipment damage. In terms of processChemistry, OXFORD Plasmalab 100 is capable of handling multiple chemistries, including SF6 with oxygen, ArCl2, CHF3, and SF6, to name a few. It also features a unique PC-based software which allows for rapid prototyping of new recipes and repeatable process fidelity. Finally, the tool features a choice of combinations of chamber capacitance and power, giving it unparalleled flexibility and scalability for multiple process applications. Overall, Plasmalab 100 is an ideal choice for applications involving plasma etching and ashing, due to its high-performance capabilities, user friendly controls and robust contamination prevention mechanisms.