Used OXFORD Plasmalab 100 #293766784 for sale

OXFORD Plasmalab 100
ID: 293766784
Wafer Size: 8"
PECVD System, 8".
OXFORD Plasmalab 100 is an advanced etcher and asher equipment engineered to deliver superior performance in research and industrial applications where accuracy and repeatability are essential. It combines an integrated, low-dimensional plasma source with rapid gas-flow control, enabling precise etching and ashing of a large range of materials. The fully programmable automated system offers significant advantages in terms of process quality and cycle time. Plasmalab 100 features dual RF plasma sources, allowing flexible processing of various materials. The excellent absorption of radio-frequency waves by the etch gas eliminates the need for a separate high vacuum unit, enabling unmatched etching and ashing rates, low residue formation and optimal profile transfer. The integrated turbulent plasma source provides good surface quality and improved selectivity for isolating different layers. Both sources are powered by a reliable and field-proven AC/DC converter, which is controllable to an accuracy of less than 0.1%. OXFORD Plasmalab 100 consists of an enclosure, a process chamber, a remote control unit and an optional sample storage mixer. The chamber is made of an ultra-thin stainless steel structure and a temperature-resistant quartz glass window for uniform plasma distribution. Both sources are integrated into the chamber and are entirely hermetically sealed, thus providing high stability and low particles emissions. The chamber is also equipped with a powerful exhaust machine with high pumping rates and low background pressures. In terms of functionality, Plasmalab 100 offers superior flexibility and control. It features unrivalled energy and efficiency control, with a wide range of power settings and process parameters. This allows for repeatable and accurate processes with optimized results. The user-friendly software and intuitive graphical interface has an extensive parameter range, enabling users to create and store multiple etching and ashing recipes for different materials. OXFORD Plasmalab 100's advanced process control tool and detailed record keeping provide unparalleled traceability. Plasmalab 100 is an innovative etching and ashing asset with unmatched performance. It provides unparalleled control, repeatability, and accuracy while offering users a wide range of features. This makes it the ideal model for research laboratories and industrial applications requiring precision and optimized results.
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