Used OXFORD Plasmalab 100 #293810520 for sale

OXFORD Plasmalab 100 is a state-of-the-art reactive ion etcher (RIE) designed for precision plasma etching of metals, dielectric materials and semiconductors in research and development applications. The easy-to-use equipment offers excellent etch uniformity and offers the ultimate flexibility by allowing multiple etching recipes to be stored in the system. Plasmalab 100 is equipped with an etch chamber which is able to maintain a high degree of consistency in etch uniformity. The chamber is enclosed in an extremely durable stainless steel housing and comes with a variety of connectors to attach a variety of inputs and outputs. The etching process is powered by a RF generator, powered by a high voltage DC power supply, and the reactive gas supply is controlled by a series of gas valves and a flow regulator. To initiate the etching process, a suitable etching recipe must be programmed into the controller. This recipe will determine the type of etch process (such as the mix of gases, flow rate, pressure, and power) that will be used for the intended application. The controller also allows for multiple preset etch recipes to be stored at once, to save time and ensure consistent results. In addition to providing excellent etch uniformity and repeatability, OXFORD Plasmalab 100 has a number of other features designed to ensure user safety. These include a water-cooled exhaust unit to reduce hazardous vapors and temperature sensors to ensure that the machine does not overheat. The tool also includes a vacuum-activated shutoff asset in the event of a pressure drop or other emergency. Plasmalab 100 is an efficient and reliable etcher / asher that is suitable for a variety of applications. With the flexibility to store multiple recipes and the added safety features, OXFORD Plasmalab 100 is a great choice for any lab looking to perform high-precision etching.