Used OXFORD Plasmalab 100 #293812431 for sale

OXFORD Plasmalab 100 is an etcher/asher designed to provide optimal conditions for the production of high-level semiconductor devices. The equipment combines a low-vacuum (1 to 1.5x10-2torr) environment and a remote plasma source based on Plasmalab 100—TEM Controlled Source. OXFORD Plasmalab 100 is an advanced three-stage plasma processing system, allowing for precise and accurate control of process parameters. The first stage consists of a high-speed, computerized tuning/matching network, allowing for variable power input. The second stage consists of an electron multiplier that is used in conjunction with a control computer to modulate ion current. The third stage consists of a vacuum-sealable cylindrical quartz etch chamber. This chamber is specifically designed to provide the user with greater control of etch parameters and optimize performance. Plasmalab 100 is ideal for making precise, high-current contacts and separations of components as well as producing high-density devices. The unit's high degree of accuracy and repeatability also makes it ideal for high-volume manufacturing of devices. OXFORD Plasmalab 100 features an internal diagnostic machine that monitors the process environment to ensure optimal performance. The tool also features a high-precision digital read-out which provides the user with greater control over etch parameters and allows for precise control of ion current. Plasmalab 100 also features a variety of process gasses, including Argon, Oxygen, and Hydrogen, which provide further control of etch parameters. The gasses also amplify power levels, helping to create better bonds and accuracy. OXFORD Plasmalab 100 also comes with a unique remote plasma source, allowing for more precise etching and precise control of process parameters. Plasmalab 100 etcher/asher is suitable for a variety of tasks, including contact and separation of components, fabrication of test structures, and high-current contacts. The asset also features a vacuum sealable quartz etch chamber, 18 electrode patterns, and an internal diagnostic model to ensure optimal performance. OXFORD Plasmalab 100 makes it easy to produce high-quality and reliable results, ensuring success in any production task. Its high degree of accuracy and repeatability make it ideal for high-volume manufacturing of semiconductor devices and make it a valuable asset for any production environment.