Used OXFORD Plasmalab 100 #293824078 for sale

OXFORD Plasmalab 100 is an etching and etching-lift-off (ELO) equipment capable of producing high-quality, highly precise capacitive coupled plasma (CCP) results. The system produces high resolution features with superior aspects, outline accuracy, and level of definition. Plasmalab 100 is optimized for use with oxide etching, oxide-lift-off photoresist, and oxide-reverse-etching processes. OXFORD Plasmalab 100 features Extremely Low Flow (ELF) plasma technology, which utilizes a unique small gas flow unit that delivers cleaner, more reliable etches through consistent process times and uniformity. The machine can be electronically tuned to a variety of operating parameters with fast and flexible response. Plasmalab 100 is equipped with a 12" vacuum chamber with a 50kHz power supply, delivering a reliable, efficientin etching process. OXFORD Plasmalab 100 also offers Automatic Frequency Tune (AFT) feature to dynamically and automatically adjust the frequency setting of the etch chamber based on the amount of material removal. This allows users to achieve deeper etches, smoother walls, and better dimensions. The tool also features precision XYZ Stage recognition and an intuitive graphical user interface (GUI). This GUI is designed to provide a simple and quick way to control chamber parameters and replicate results, even during the middle of a multi-layer etch job. The asset also comes with comprehensive, comprehensive process control and diagnostic features, including advanced simulation capabilities, non-maintained fault detection, and chamber status monitoring to ensure optimal process performance. Additionally, Plasmalab 100 provides beam defocus sensor, automated focus tuning, programmable beam intensity, and an advanced layer-by-layer recipe building capability. Overall, OXFORD Plasmalab 100 is an efficient and powerful etcher that is designed to provide users with consistently high-quality results with unbeatable precision and uniformity. The model's advanced features make it an excellent choice for both prototype and production etching applications.