Used OXFORD Plasmalab 100 #9097045 for sale
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ID: 9097045
Wafer Size: 6"
ICP System, 6"
Currently configured for 4"
Inductive Coupled Plasma Source (180 ICP)
Chuck type: Mechanical Clamping
Load-locked single chamber (ICP)
Advanced Energy RFX600 13.56 Mhz RF Generator
Advanced Energy RFX3000 13.56 Mhz RF Generator
Alcatel ATH1300M Maglev Turbo Pump
Alcatel ACT 1300M Controller
HP Compaq Computer w/ Win NT 4.0
PC2000NT Software Ver. 2.57.92
LCD Monitor, Keyboard, and Mouse
(2) Leybold Vacuum Pumps
EMO Button
Operations Manual
(6) MFCs consisting of:
CHF3
SF6
O2
Ar
C4F8
BCL3
2002 vintage.
OXFORD Plasmalab 100 is an etcher/asher designed to deliver enhanced and repeatable results in plasma processing. This device offers a versatile platform, allowing users to quickly and easily switch between etching and ashing applications, while accommodating both in-line and batch configurations. This versatile etcher/asher equipment is powered by OXFORD advanced radio-frequency (RF) plasma source technology, which utilizes a main RF generator with variable power output up to 100s of watts together with advanced chambers for deposition, etching and ashing control. Plasmalab 100 features an ultra-fast recipe system to rapidly optimize process results. This machined steel chamber features digital PID controlled uniform heating and cooling, inert purge, and a variety of process recipes. The unit is capable of both atmospheric and low-pressure etching and ashing, ensuring that the most compatible and optimal process conditions are always maintained in the chamber. The built-in safety and protection systems on OXFORD Plasmalab 100 are comprehensive and comprehensive, preventing the user from accidentally damaging the chamber or other components. The machine includes over-temperature protection, over-current protection, and safety interlock systems to ensure safe operation. The integrated fume extraction tool safely removes any vaporized media, so that it doesn't enter the work area. Plasmalab 100 also features an integrated control asset that enables users to automate the most commonly used commands, such as recipe selection, pump control, and controller selection. This control model allows users to quickly and easily program a wide variety of parameters with just the click of a mouse. Additionally, the equipment includes a complete graphical user interface that provides real-time monitoring and control of many system parameters. OXFORD Plasmalab 100 is a cost-effective, versatile etcher/asher, designed to provide enhanced repeatability in plasma processing applications. By leveraging the advanced RF source technology, this unit offers a range of benefits over traditional etching methods, such as better process uniformity and increased repeatability. Additionally, the integrated safety protections provide a secure working environment, while the built-in control machine allows the operator to quickly automate processes.
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