Used OXFORD Plasmalab 100 #9258339 for sale

OXFORD Plasmalab 100 is a high-precision plasma etcher/asher scientifically designed to achieve optimum process performance. It enables fast, accurate etching and ashing of the most challenging substrates and materials such as organic dielectrics, metals, nitrides, and other difficult-to-etch materials. The tool utilizes accurate substrate heating and highly efficient modular active visual deposition control for creating components. Plasmalab 100 has automated vessel loading, end-point detection, and gas managing capabilities. The automated vessel loading ensures that the substrates inside the chamber are placed in a safe and secure environment. End-point detection enables monitoring of gas flow, time, pressure, and RF power. The gas managing system controls the process parameters required for a successful etching/ashing process. The system also helps reduce down time caused by substrate handling errors. The system is integrated with a large chamber to provide uniform etching on the entire wafer. This large chamber houses the plasma source, electrodes, and the process specific vapors to perform the etching process. OXFORD Plasmalab 100 is integrated with two different types of plasma sources, namely RF Source and Magnetron plasma source. The RF source is used primarily for dry etching processes while the more advanced magnetron plasma source is ideal for wet etching processes. Plasmalab 100 is integrated with high-precision advanced temperature control (ATC) systems which allow the tool to heat up the wafer to the required temperature with accuracy. This ensures highly accurate etching processes with minimum impact on the surface quality of the wafer. It is also designed to provide a maximum of 400W of power for the wafer. The high power of OXFORD Plasmalab 100 also enables faster etching processes. Plasmalab 100 is integrated with advanced End Point Detection technology which provides an accurate real time view of the etch process. This technology is extremely accurate, yet offers very low cost of ownership. The software packages that come with OXFORD Plasmalab 100 provide a wide range of process support capabilities. Overall, Plasmalab 100 presents a cost-effective and high-precision etching and ashing tool for most advanced materials. The accuracy and precision of the process can be widely compared to other premium etcher/asher systems with a much lower overall cost.