Used OXFORD Plasmalab 100 #9364613 for sale

OXFORD Plasmalab 100 is an etcher/asher based on an inductively coupled Plasma (ICP)-driven source. It consists of a single large source chamber into which a variety of gases can be injected in order to allow for the etching/ashing of a wide range of materials. The chamber has been designed for use with both large wafer substrates and with the desired plasma parameters for high-precision etching/ashing results. It is equipped with a low-pressure inductively coupled Plasma source that supplies both ions and neutral species for etching/ashing. The self-biasing system allows for the adjustment of plasma parameters such as the source power, electrode separation, and RF frequency. The chamber of Plasmalab 100 is capable of etching/ashing samples of up to 8 inches in diameter while achieving ultra-high etching aspect ratios and minimizing samples distortion. It is equipped with a wide variety of hardware and software features that enable the control of parameters such as process pressure, gas flows, forward and reverse sputtering of the wafer surface, and the ability to process samples of different heights. Additionally, it includes a built-in pressure monitor and a low-pressure pump that can reduce pressure inside the chamber to very low levels. OXFORD Plasmalab 100 also features a high-resolution imaging system that can be used to monitor etch/ash processes in real time and thus minimize the need for post-processing imaging. Its automated pumping system enables the repeated measurement of etch/ash processes and allows for precise adjustment of plasma parameters for improved repeatability. Plasmalab 100 also has protective safety interlocks to minimize the risk of over-pressure and explosiveness in the source chamber. OXFORD Plasmalab 100 also contains a high-power RF generator capable of generating frequencies ranging from 500 to 5000 Hertz. This feature enables the variation of process parameters and the optimization of etching/ashing profiles to better match the customer's desired outcome. Additionally, a series of integrated safety and safety alarms monitors the pressure inside the chamber to ensure optimal working conditions. Plasmalab 100 also includes several built-in monitoring systems that help to reduce maintenance costs by alerting users when maintenance is needed. Overall, OXFORD Plasmalab 100 is an advanced etcher/asher with all the features necessary to achieve high-precision etching/ashing results. Its comprehensive features make it suitable for a wide variety of etching/ashing applications. The sophisticated hardware and software features, coupled with its integrated safety systems, ensures that Plasmalab 100 provides consistent and reliable etching/ashing performance for all users.