Used OXFORD Plasmalab 133-ICP 380 #293779277 for sale
URL successfully copied!
Tap to zoom
ID: 293779277
Wafer Size: 12"
Vintage: 2010
Etcher, 12"
Maximum rated input current: 42 A
Interrupting current: 6 kA
RF Power: 600 W, 13.56 MHz
Water-cooled electrode: 10°C - 80°C
Endpoint detection: Verity optical emission spectroscopy (200-800 nm)
(7) Mass Flow Controllers (MFC):
Gas / Size
Ar / 100 SCCM
Cl2 / 100 SCCM
BCl3 / 100 SCCM
N2O / 200 SCCM
CHF3 / 200 SCCM
NH3 / 100 SCCM
CH4 / 50 SCCM
Power supply: 415 VAC, 3 Phase, 50 Hz
2010 vintage.
OXFORD Plasmalab 133-ICP 380 is a plasma etching / ashing equipment designed to enable high quality results in the fabrication of advanced materials for the semiconductor and microelectronics industries. This etcher / asher is built for compatibility with a variety of process gases, and is capable of high throughput production and repeatable results. OXFORD PLASMALAB 133 ICP380 uses a built-in high-frequency RF generator to generate a plasma in order to etch or asharise the substrate material, which is supported by a conveyor belt. This plasma etches or ashes the material via a highly ionised gas such as silane, or nitrogen trifluoride. Plasma processing enables a much more rapid and more precise production process compared to other etching and ashing methods, which can result in decreased costs in manufacturing. PLASMALAB 133 ICP 380 has a number of features which enable users to maximise the quality of results. It utilises OXFORD Instruments' enhanced e-gun technology, which provides a higher ionisation level of process gases for improved etching rates. It also features an additional process control system, which monitors gas flow, pressure, temperature, and power levels to ensure precise and consistent results. The unit is designed to enable users to customise process parameters to achieve the most effective results for a particular application. Plasmalab 133-ICP 380 is built for robust, reliable operation and is designed for use in a wide range of industrial environments. It is outfitted with a durable stainless steel chamber which enables the machine to handle high temperatures during etching and ashing processes. Additionally, OXFORD PLASMALAB 133 ICP 380 is designed for easy maintenance, with easily replaceable parts and a self-diagnostic tool that can detect potential problems. In conclusion, PLASMALAB 133 ICP380 is a reliable, robust etching / ashing asset designed to deliver high quality results for advanced semiconductor and microelectronics applications. It is capable of high throughput production and can be tailored to a wide range of requirements, enabling users to maximise efficiency and minimise costs.
There are no reviews yet