Used OXFORD Plasmalab 133-ICP 380 #293797492 for sale

OXFORD Plasmalab 133-ICP 380 is a plasma etching/ashers equipment that has been specifically designed for reactive ion etching (RIE), inductively coupleds plasma (ICP) etching and ashing processes. This versatile plasma etching/ashers system offers precise process control with its advanced ICP generator and gas delivery unit. It is capable of etching and ashing techniques used in the semiconductor, MEMS, optoelectronics, data storage, LCD and many other industries. OXFORD PLASMALAB 133 ICP380 incorporates a standard RPC-150 Remote Plasma Chamber (RPC) to enable precise process control of etching and asher applications. It is equipped with a variety of customizable features such as automatic start and stop, RF power control, and an automatic gas flow monitoring machine. The RPC-150 is equipped with a 17 litre capacitance-coupling-network chamber that utilizes a highly efficient and uniform ionization of the gas by inductively coupling high-frequency RF energy to the desired process. This helps to ensure consistent processing results with ultra-low etch/ash rates. PLASMALAB 133 ICP 380 is also equipped with a powerful ICP gas delivery tool. It offers advanced features such as gas panels with multiple channels, an integrated electrical safety interlock, and 3D gas flow simulations. The gas delivery asset ensures that the model operates at optimum process conditions, providing superior process performance and process control. The controller of OXFORD PLASMALAB 133 ICP 380 is a fully programmable, Graphical User Interface (GUI) based microprocessor. This advanced controller provides precise control of the equipment at all process stages. The controller supports a variety of system parameters such as, chamber pressure, substrate temperature, ashar rate, etcher rate, power, gas flow and phase-modulated RF generator. The unit also supports custom process recipes developed for any specific application. PLASMALAB 133 - ICP 380 is a reliable and robust plasma etch/ash process chamber machine. It is capable of providing repeatable and high-quality results regardless of the etching or ashing applications. The tool's custom process recipes make it well-suited for various kinds of applications in the fields of semiconductor, optoelectronics, MEMS, and many others. Plasmalab 133-ICP 380 is an ideal etching and ashing asset for achieving excellent process repeatability and accuracy for high-performance results.