Used OXFORD Plasmalab 133-ICP 380 #293830096 for sale

OXFORD Plasmalab 133-ICP 380 is an advanced etcher/asher that offers reliable and efficient operation, making it an ideal choice for demanding etching/ashing applications. The equipment features a high-performance inductively coupled plasma (ICP) source, enabling rapid, high quality etching/ashing processes. At the heart of OXFORD PLASMALAB 133 ICP380 is a powerful 13.56 MHz ICP source. This is coupled to a real-time digital controller, allowing precise control over the etching/ashing process. The ICP source is capable of delivering high power densities of up to 65 W/cm2 with high process repeatability. This ensures short cycle times and high throughput while maintaining excellent etch/ash quality. PLASMALAB 133 ICP 380 features an adjustable working pressure range of 5 to 20 mT, with a maximum supply voltage of 500V, and a maximum plasma source power of 500 W. This enables precise control over the etching/ashing process, allowing for superior results. The system also includes a user-friendly software interface, allowing easy configuration and optimization of etching/ashing parameters. PLASMALAB 133 - ICP 380 is equipped with a wide range of accessories, including a quartz showerhead with an integrated nozzle, as well as an integrated safety unit for protecting the plasma source from accidental overload. The machine also features a small footprint, allowing it to be easily integrated into most existing experimental setups. OXFORD PLASMALAB 133 - ICP 380 is an excellent choice for etching/inking tasks in semiconductor, MEMS and other microfabrication processes. With its precise control of the etching/ashing process, excellent etch/ash quality and high efficiency, it offers an excellent cost-benefit ratio for researchers and industries that demand high precision and high performance without exceeding their budgets.