Used OXFORD Plasmalab 133 Plus #293651566 for sale

OXFORD Plasmalab 133 Plus
ID: 293651566
Wafer Size: 4"
Reactive Ion Etcher (RIE), 4".
OXFORD Plasmalab 133 Plus is an advanced plasma etcher or asher for the purpose of performing high purity and low-damage etching and ashing processes on a variety of materials, including silicon, polyimide, polymeric dielectrics, and alloys. This equipment is equipped with an ultra-high purity plasma source capable of producing a wide range of chemically-reactive radicals, molecular and derated ions, and electrons, allowing for high-precision etching or ashing of all types of materials. Its wide-range of process gases affords operations with etching and ashing of doped or undoped polymers and silicon materials. The system features highly accurate and reliable power applied to the wafer, making it ideal for high-volume precision wafer processing. Plasmalab 133 Plus is designed with a quick-change option, permitting users to switch between the etch, asher and the stand-alone plasma cleaner within a few minutes. Its built-in automatic pressure controls and fast cycle time shortens processing time and maintains the highest level of quality. OXFORD Plasmalab 133 Plus includes a web-based process monitoring and reporting unit. Offering a user-friendly interface and providing data logging and process recipes, this machine helps optimize and speed up the etch or ash process, while also providing process traceability and access to performance data. Plasmalab 133 Plus is also designed to be self-contained and easily integrated into existing production lines. Its highly repeatable process and consistent results make it ideal for a wide range of applications including semiconductor processing, circuit board and packaging, and microfluidic devices. This makes it a cost-effective solution for etching and ashing processes. In addition, OXFORD Plasmalab 133 Plus has an easy to use control station, which makes it simple to use and set up for new processes. For users needing access to a wide range of process gases, the Plasimalb 133 Plus has an optional six chamber gas cabinet, allowing for quick and effortless swapping of process gases. This etcher / asher is the perfect solution for clean, low-damage processing of semiconductor and other microelectronic materials. The tool's advanced design and integral web-based performance monitoring asset make it both cost-effective and reliable, allowing users to achieve the highest quality etch and ash results.
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