Used OXFORD Plasmalab 133 Plus #9130693 for sale

ID: 9130693
Vintage: 2004
RIE (FL) dry etcher RIE set up for SiO2 Etch 330mm Platen RF Power: 600W, 13.56MHz Load lock with Turbo Pump Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar: 100sccm N2: 200sccm CHF3: 200sccm NF3: 200sccm N2O: 200sccm Windows PC , user friendly interface 2004 vintage.
OXFORD Plasmalab 133 Plus is an etcher/asher equipment engineered for a wide range of plasma processing applications. This tool is equipped with a fast power supply that ensures high-quality operation while conserving valuable substrate material. The system provides users with a reliable, easy-to-use interface for precise, repeatable processes. It is the ideal tool for sputter etching and deposition in a variety of applications, such as circuit board production, data storage device patterning, and nanotechnology device fabrication. Plasmalab 133 Plus is powered by an advanced, three-stage multi-frequency power supply with a maximum output power of 200 W for efficient, precise operation. The power supply is designed to provide a constant power for repeatable processes, while mastering the tricky transition from RF to DC sputter etching. Additionally, the generator enables the unit to be used with a wide range of chambers, nozzles, and vacuums for optimal process performance. OXFORD Plasmalab 133 Plus is equipped with a built-in vacuum chamber capable of accommodating a variety of substrate sizes. The chamber features a sealed structure which prevents etching gases from escaping and ensures that optimal process conditions are maintained. In addition, the machine is equipped with automatic gas flow control, enabling the user to program specific process gas concentrations with accurate and repeatable results. Plasmalab 133 Plus also offers an advanced, intuitive software interface. This user-friendly software provides control of all process parameters, including gas flow and pressure, as well as options to set gas flow profiles, automatic pressure regulation, and other advanced features. Additionally, the tool is compatible with numerous CAD systems for easy process integration across facilities. Overall, OXFORD Plasmalab 133 Plus is an ideal asset for precise, repeatable etching and deposition applications. Its advanced power supply, built-in vacuum chamber, and intuitive software are designed to ensure users receive reliable, high-quality results with ease. This versatile tool is the perfect addition to any laboratory, allowing users to carry out a variety of plasma processes quickly and successfully.
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