Used OXFORD Plasmalab 400 #293768152 for sale

OXFORD Plasmalab 400 is a cutting-edge etcher/asher equipment designed for precise and efficient plasma processing of various materials in research and industrial applications. Developed by OXFORD Instruments, a leading provider of high-tech tools and systems for a wide range of scientific and industrial applications, Plasmalab 400 represents a state-of-the-art solution for etching, cleaning, and modification of substrates with high precision and repeatability. At the core of OXFORD Plasmalab 400 system is its advanced plasma source, which generates a highly reactive plasma that can be controlled and tuned to achieve specific process requirements. The unit is equipped with a radio frequency (RF) generator that supplies power to the plasma source, allowing for the generation of a stable and uniform plasma discharge. This plasma can be used for etching processes, where material is selectively removed from the substrate surface, or for asher processes, where organic contaminants are removed through oxidation and volatilization. Plasmalab 400 offers a wide range of process capabilities, making it suitable for a diverse set of applications in research and development. The machine can accommodate various types of substrates, including silicon, glass, metals, and polymers, and can be used for etching and ashing of thin films, pattern transfer, surface modification, and cleaning. The tool is highly versatile and can be easily configured to meet specific process requirements, such as etch rate, selectivity, uniformity, and etch profile control. One of the key features of OXFORD Plasmalab 400 is its precise process control and monitoring capabilities. The asset is equipped with advanced software that allows users to define and optimize process parameters, such as gas flow rates, pressure, power, and temperature, in real-time. This level of control enables users to achieve high process repeatability and uniformity, resulting in consistent and reliable results across different process runs. In addition to process control, Plasmalab 400 also offers advanced diagnostic and monitoring capabilities to ensure optimal model performance. The equipment is equipped with in-situ spectroscopic ellipsometry, optical emission spectroscopy, and mass spectrometry tools, which allow users to monitor plasma chemistry, species concentration, and surface reactions during processing. These diagnostic tools provide valuable insights into the plasma-surface interactions and help users to optimize process conditions for desired outcomes. OXFORD Plasmalab 400 is designed with user convenience and safety in mind. The system features a user-friendly interface that allows for easy setup, operation, and maintenance. Safety interlocks and protocols are in place to ensure safe operation of the unit and to protect users from potential hazards associated with plasma processing. The machine is also equipped with advanced gas handling and control systems to ensure precise and reliable gas delivery during processing. In summary, Plasmalab 400 is a highly advanced etcher/asher tool that offers exceptional process control, monitoring, and diagnostic capabilities for a wide range of plasma processing applications. With its versatility, precision, and reliability, OXFORD Plasmalab 400 is a valuable tool for researchers and industrial users looking to achieve high-quality results in materials processing and device fabrication.