Used OXFORD Plasmalab 80 Plus #293616592 for sale

OXFORD Plasmalab 80 Plus
ID: 293616592
Plasma Enhanced Chemical Vapor Deposition (PECVD) system.
OXFORD Plasmalab 80 Plus is a professional etching and ashing equipment used in the production of various microelectronic components. This equipment offers users an unparalleled level of precision and speed in its production processes. Plasmalab 80 Plus utilizes a state of the art plasma generation chamber to produce reactive ions; when these ions come into contact with the material being etched or ashed, the gamma layer between the substrate material and the desired surface is quickly and accurately dissolved. This makes the etching and ashing process more efficient, accurate and precise than traditional methods. OXFORD Plasmalab 80 Plus contains a 25 micron plasma source with an adjustable power setting from 0 - 1000 watts and up to 30°C temperature level. It can achieve a rate of etching of up to one micron per minute, depending on the conditions of the substrate material, with a minimum pitch erosion of 2000 nanometers. The machine also includes a temperature control unit, which allows the temperature of the etching or ashing process to be adjusted to suit the substrate material. This enables users to accurately control the accuracy and precision of the production process. The process gas system of Plasmalab 80 Plus consists of various gaseous elements, including oxygen (O2), hydrochloric acid (HCl), sulfur hexafluoride (SF6), nitrogen trifluoride (NF3) and others, which can be used to meet the specific process requirements of different substrate materials. The equipment is also equipped with a vacuum unit that allows the substrate material to be quickly placed into etch and ashing processing environment without damaging the material. This enhances the safety and accuracy of the production process. Overall, OXFORD Plasmalab 80 Plus is a highly precise and efficient etching and ashing machine that produces accurate, precise results with minimal waste material. Its in-depth operational features and comprehensive design make it suitable for a variety of microelectronic manufacturing processes.
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