Used OXFORD Plasmalab 80 Plus #293637518 for sale

OXFORD Plasmalab 80 Plus is an advanced etching and processing equipment designed to meet the needs of a variety of advanced semiconductor technology research and development applications. The system combines an ultra-high-precision etching structure with high-efficiency hardware and software peripheral components, providing users with a comprehensive process development platform. Plasmalab 80 Plus is composed of a host unit, process chamber, and multiple peripheral components. The host machine consists of an integrated platform control tool and optimized scheduling logic, as well as multiple advanced display tools and special subsystems. The process chamber includes a vacuum chamber, a plasma source, and a showerhead. The vacuum chamber is equipped with a turbo-molecular pump, allowing users to achieve absolute pressures of up to 1 x 10-6 Torr. The showerhead is a multi-referencing optically-cleaned quartz top-porter, enabling complete process traceability. The plasma source is an advanced electro-magnetic-based, direct-flow source which helps to support high-aspect ratio feature etching. Furthermore, OXFORD Plasmalab 80 Plus is equipped with multiple peripheral components, including a recipe management asset, a sample management model, a process control and data acquisition equipment, a manual sample loading system, a gas and chemical control unit, a sample alignment machine, a resist follower and imaging tool, and a CVD asset. The recipe management model facilitates the rapid development and optimization of new processes, allows for the efficient management, monitoring and control (above the semiconductor device production, testing and measuring), and facilitates real-time process monitoring and product collection. The sample management equipment allows for the automated collection and cleaning of wafers and samples during the etching process and assists in the collection of clean wafers after etching. Plasmalab 80 Plus is a sophisticated etcher/asher system that is capable of providing optimized etching processes and sophisticated peripheral facility-related control systems, providing researchers and developers with a comprehensive, multifunctional platform for etching and processing needs.