Used OXFORD Plasmalab 80 Plus #293665218 for sale

ID: 293665218
Reactive Ion Etcher (RIE) / Inductive Coupled Plasma (ICP) Etcher Cl2 SF6 SiCl3 CHF3 O2/Ar Chiller.
OXFORD Plasmalab 80 Plus is an etching/ashing equipment that offers a reliable, repeatable and robust solution for the etching or ashing of various substrates and materials. Plasmalab 80 Plus employs a range of precision etching processes including reactive ion etching (RIE), inductively coupled plasma (ICP), and plasma-enhanced chemical vapor deposition (PECVD) etching. The process can be programmed in a number of ways to ensure optimal etching results. OXFORD Plasmalab 80 Plus is designed to perform various processes in a vacuum chamber. It is capable of etching and ashing materials at a wide range of temperatures, from ambient to 250°C. With a highly accurate power supply ranging from 0 to 1000 watts, the system can be programmed with DC power applications and various waveforms for an array of etch processes with different chemistries. Plasmalab 80 Plus is equipped with an automatic sample transfer unit and sample stages to easily transport wafers. It also features software, allowing the user to control the etching process and maintain uniformity throughout the etch cycle. Furthermore, special provisions are made for hazardous materials and chemicals, providing a safe environment. The machine comes with a number of safety features for complete protection of the user. It includes multiple interlocks, pressure monitoring, oxygen and water sensors, and emergency shutoffs. Moreover, the tool is designed to minimize contamination to the chamber and parts throughout the process. OXFORD Plasmalab 80 Plus is the perfect solution for research applications, and other applications requiring highly precise configurations of etch or ashing operations. Its cutting-edge technologies, combined with repeatability and uniformity, makes it the ideal choice for those looking for reliable etching and ashing processes.
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