Used OXFORD Plasmalab 80 Plus #293697553 for sale
URL successfully copied!
Tap to zoom
ID: 293697553
Wafer Size: 4"-6"
Vintage: 1995
PECVD System, 4"-6"
Deposition: SiO2, SiH4 at 300°C
No burner gas abatement
EDWARDS E2M80 Vacuum pump
Mass Flow Controller (MFC)
RF Generator
PC Controller
1995 vintage.
OXFORD Plasmalab 80 Plus is a highly advanced etcher/asher equipment with plasma technology designed for precision etching and ashing processes in semiconductor manufacturing and research applications. Developed by OXFORD Instruments, a leading provider of high-tech instrumentation for various industries, Plasmalab 80 Plus is renowned for its superior performance, reliability, and versatility in handling a wide range of materials and substrates. At the core of OXFORD Plasmalab 80 Plus system is its advanced plasma source technology, which generates a highly reactive plasma environment ideal for etching and ashing processes. The unit utilizes a combination of RF (radio frequency) and microwave energy to create a controlled plasma discharge that efficiently breaks down and removes material from the surface of substrates with high precision and uniformity. The plasma source is equipped with sophisticated impedance matching and tuning capabilities to maintain stable plasma conditions and optimize process performance. Plasmalab 80 Plus features a large process chamber with a variable power supply that allows users to tailor the plasma energy density and distribution according to specific process requirements. The machine offers a wide range of gas injection options, including reactive gases like oxygen, fluorine, and chlorine, as well as inert gases such as argon and helium, enabling a diverse set of etching and ashing processes to be performed with precise control over etch rates, selectivity, and profile features. In terms of substrate handling and process control, OXFORD Plasmalab 80 Plus is equipped with a versatile sample stage capable of accommodating various sizes and types of substrates, including wafers, photomasks, and flat panel displays. The tool is designed for automated operation with intuitive software interfaces that allow users to program and monitor process parameters in real-time, ensuring reproducible and consistent results across multiple processing runs. Safety and reliability are paramount considerations in the design of Plasmalab 80 Plus asset, with built-in features such as interlock mechanisms, gas flow monitoring, and vacuum pressure sensors to ensure safe and efficient operation. The model is also equipped with advanced diagnostic tools and real-time monitoring capabilities to detect and respond to any abnormalities or deviations in process conditions, minimizing downtime and optimizing productivity. Overall, OXFORD Plasmalab 80 Plus is a cutting-edge etcher/asher equipment that represents the pinnacle of plasma processing technology for semiconductor fabrication and research applications. With its advanced plasma source technology, flexible process control capabilities, and robust design, Plasmalab 80 Plus offers unmatched performance and versatility for etching and ashing processes, making it an indispensable tool for researchers and manufacturers seeking to achieve the highest precision and quality in device fabrication.
There are no reviews yet