Used OXFORD Plasmalab 80 Plus #293811830 for sale

OXFORD Plasmalab 80 Plus is an etcher / asher specifically designed for the physical vapour deposition (PVD) and dry-etching requirements of research laboratories. This powerful etcher / asher delivers a variety of control capabilities to ensure customisable processing of samples for PVD and etching operations. Plasmalab 80 Plus features s digital-based, computer-controlled equipment for managing both the parameters of the PVD and dry etching operations. This system allows for the manual and automated control of the etching process's parameters, such as gas flow, pressure, and plasma power. In addition, the unit offers 8 gas lines, a manual and an automated pressure-control machine, and both manual and automated plasma control capabilities. OXFORD Plasmalab 80 Plus also offers a variety of other features such as an advanced security tool, an integrated RF detector to monitor the radiofrequency conditions, and an over-temperature shut-off asset. Additionally, all the components of Plasmalab 80 Plus are designed to provide long-term reliability, as well as long-term cost savings. The etcher / asher is also equipped with PTFE-coated gate valves, an active cooling model, and an advanced exhaust equipment that ensure maximum safety, as well as a streamlined operation. These features provide optimal safety for operators, as well as a reliable, high-quality etching process. OXFORD Plasmalab 80 Plus is also compatible with a variety of accessories, such as load locks, a load port, power supplies, and process control solutions. This allows for the customisation of processes and increased control over the etching process's parameters. Overall, Plasmalab 80 Plus is an advanced, computer-controlled etcher / asher designed for PVD and dry-etching in research laboratories. It offers a variety of control capabilities, as well as additional features like an integrated RF detector, active cooling system, and PTFE-coated gate valves. Moreover, OXFORD Plasmalab 80 Plus is compatible with various accessories, allowing for increased control over the etching process's parameters.