Used OXFORD Plasmalab 80 Plus #9398272 for sale

OXFORD Plasmalab 80 Plus is a high-performance integrated etcher/asher equipment suitable for research and educational use. It is capable of precise demonstrated sample processing for various materials, including silicon and polymers. The complete system includes the base unit, a down-looking optics, an up-looking optics, and a gas handling unit. The base unit is a precision-engineered airtight chamber embedded within a frame with provisions for electrical wiring and a control machine. This chamber is constructed from stainless steel, anodized aluminum, and reinforced acrylic materials and controls temperature helium backfill with a patented sealed lid design. The premixed production processes provided by the base unit ensures stable performance and yields homogenous results. The down-looking optics provide uniform illumination over the substrate surface and its digital light-columns ensure a high-resolution imaging tool. The down-looking optics has a field of view that can extend up to 22.6 mm (1 inch). A variable range of working distances are available (3.3-11.3 mm). The optical asset is designed to optimize the illumination of the sample surface and to ensure the best possible performance. The up-looking optics covers a range of 0.1-400 Å and can be used for monitoring etching and patterning. It provides a high-resolution imaging model with a magnification up to 1400X and is equipped with a state-of-the-art imaging and pattern recognition equipment. The gas handling system of Plasmalab 80 Plus consists of a main control unit and five independent mass-flow controllers and process valves to control the delivery of gases (oxygen and argon). The gas supply unit is designed for both batch and continuous processes which can be monitored and controlled with a full range of process control software. Additionally, the controller is capable of substrates and materials monitoring, deposition metrology and patterning. OXFORD Plasmalab 80 Plus is an advanced tool for precise processing and patterning of various materials and is ideal for educational and research purposes. The exceptional performance and engineering incorporated into the machine make it a top choice for reliable and precise etching and ashing processes.