Used OXFORD Plasmalab 80 Plus #9409921 for sale
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ID: 9409921
Wafer Size: 8"
Vintage: 2009
Plasma Enhanced Chemical Vapor Deposition (PECVD) System, 8"
Diameter electrode: 460 mm, 4"-12"
Chamber uniformity: <2%
Silicon nitride and silicon dioxide layers
Top electrode, 18.75"
With shower head gas
Electronics and vacuum component
Mass flow controller
Wall mounted gas pod
(6) MFC Gas controllers
Gases: He, N2, N2O, NH3, 5% SIH4 / 95% N2, 80% CF4- 20% O2
PC Controller
Advanced graphics and process recipe pages
Vacuum pump and blower package
Power supply: 208 V, 18 A, 3Phase
2009 vintage.
OXFORD Plasmalab 80 Plus is a state-of-the-art etcher / asher designed to provide precise and efficient performance in a variety of commercial and laboratory environments. Built from the latest technologies and advanced process flow, it builds layers of metal and other materials at precise thicknesses, quickly and accurately. The machine is based on a carefully designed chamber and pump assembly, which is capable of pumping out up to 55 liters of argon at 500 mbar. This is controlled by a high-precision software package that enables users to accurately monitor and control the etching / ashing process. The chamber is equipped with the latest electron optics, which help the etching / ashing process to take place more efficiently and accurately. Specialized inductively-coupled plasma (ICP) sources are also installed, which are made from the highest quality materials and offer increased power deposition of up to 1000 W. With these improved sources and optics, Plasmalab 80 Plus is able to make excellent etching / ashing performances within just a few minutes. Furthermore, the sources can make etching / ashing that is 50% faster than before. The other components of this etcher / asher includes a high performance turbomolecular vacuum pump and a fast mass flow controller (MFC). The vacuum pump can reach top pressures of 1.3 x 10 -5 Torr during the process, while the MFC provides high-speed temperature control. A separate assembly is used to optimize the etching / ashing process by providing extra high power sources and advanced process control. The high accuracy of OXFORD Plasmalab 80 Plus is what makes it stand out among its competitors. It can accurately adjust etching / ashing parameters down to one-thousandth of a millimeters, enabling users to produce very precise results. The reliable performance of the machine also ensures minimal waste and cost, as it consistently produces consistent and accurate results. Overall, Plasmalab 80 Plus is an ideal choice for those who need precise and efficient etching / ashing for their projects. Thanks to its advanced design, reliable performance, and high accuracy it is perfect for commercial and laboratory environments. Its price tag may seem steep, but the machine offers an excellent return on investment.
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