Used OXFORD Plasmalab 80 #293647911 for sale

OXFORD Plasmalab 80 is a reliable high performance etcher/asher vacuum equipment ideal for a wide range of lab applications. This system can etch or ashe single or multi-layered samples on one or two substrates at a time. It also offers a wide choice of working gases to select from, allowing users to customize their processing conditions, such as etching or ashing times, temperature, power and pressure settings, to name a few. Plasmalab 80 features an easily accessible process chamber and intuitive touch-screen interface for fast and efficient setup. The chamber, with dimensions of approximately 200 mm deep x 400 mm wide x 150 mm high, can be operated safely in either vacuum or pressure mode. The chamber also has a top-mounted RF cathode and planar induction coil enabling optimal distribution of the etching and ashing power. The chamber is furthermore equipped with a gas inlet, a gas exhaust and a vacuum valve which can be individually controlled for precise settings. OXFORD Plasmalab 80 has a high-resolution color touch screen display for easy parameter settings and an intuitive user interface. This unit supports a wide range of process conditions, from DC or RF planar etching/ashing, to inductively coupled plasma etching or high temperature annealing. In addition, Plasmalab 80 is equipped with a Langmuir probe for diagnostics and temperature control of the process chamber. OXFORD Plasmalab 80 is a highly accurate machine which can be pre-set to repeat the same etching and ashing process, allowing users to achieve repeatable results with minimal input. Additionally, the tool includes an inertial gas cleaning asset to reduce nano particle pollution, and expandable pattern generator software to easily modify patterns. Overall, Plasmalab 80 is a simple and reliable etcher/asher vacuum model that is ideal for tasks involving research and development, etching, ashing and annealing. It is an excellent choice for laboratories seeking a reliable, high-performance equipment that facilitates fast processing and repeatable results.