Used OXFORD Plasmalab DP-80 #293651901 for sale
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OXFORD Plasmalab DP 80 is an etcher / asher for the production of high quality, ultra-thin films. It is one of the most advanced plasma etching and deposition systems available today and is used for a wide range of applications, including processing of semiconductor microelectronics, nanotechnology, data storage media, and other applications requiring precision layers. At its core, Plasmalab DP 80 consists of a process chamber featuring a computer-controlled vacuum wafer transfer system, an ion source, and a multi-gas inlet. It has been designed to operate in either low-pressure (<50 mTorr) or high-pressure (<300 mTorr) vacuum. The entire unit is also equipped with an inertial temperature stabilized plasma (ITSP) source, providing a highly uniform deposition/etching process that is independent of wafer motion. OXFORD Plasmalab DP 80 also comes with a fully programmable gas system, allowing users to customize their process solutions and optimize their film properties. In addition, Plasmalab DP 80 includes a specially developed plasma source that supplies both positive and negative ions for applications such as ion beam erosion and ion implantation. The DP 80 is capable of pattern discrete features to resolutions of as low as 25 microns and is designed to be compatible with any PECVD, sputtering, and evaporation process. The machine is also designed to be compatible with a variety of different deposition and etching processes such as dielectric, poly-Si, copper, cobalt, silver, aluminum, and titanium etchants. OXFORD Plasmalab DP 80 can be integrated into many laboratories and facilities, and its robust construction and high-end components make it a popular choice for mass-manufacturing processes. For example, its robust construction and high-end components allow it to operate up to pressures as high as 98 Torr and feature automatic chamber cleaning and wafer rotation, with a repeatability rate of better than 1 micron. Overall, Plasmalab DP 80 is a versatile and powerful plasma chemical etching and deposition system. This is a great choice for various industries needing precision film layers for their products, and its customizable features and operation make it ideal for mass-production runs. With its advanced operation and scalability, this is an excellent choice for anyone needing an industrial-grade etcher / asher.
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