Used OXFORD Plasmalab uEtch #293604265 for sale

OXFORD Plasmalab uEtch is an advanced etching equipment designed for the production of nanoelectronic and plasmonic structures. It is highly versatile, making it suitable for research, development and industrial applications. The etcher is based on a multi-head design, allowing experimentation with a wide range of parameters to optimize pattern formation and yield. The system supports both directional and non-directional etching, enabling intricate etching patterns as well as bulk, over-etch etching. At the heart of the unit is an inductively coupled radio frequency (RF) power generator, capable of providing both positive and negative ion densities. This enables precise control over the etching process, giving the user the ability to adjust the etch rate and select the required profile. To ensure a consistent and stable process the generator is equipped with feedback and interlock monitoring. Plasmalab uEtch machine comes with a user-friendly touch screen interface, allowing the user to control various parameters including the etch rate, acceleration voltage and electrode separation. In addition, the tool supports various control modes, such as open- or closed loop, ensuring that the etch process can be precisely monitored and adjusted for the best result. The asset also has an isolated plasma chamber, which ensures that any charged particles generated by the etching process do not interfere with other model parameters. As an additional safety measure, the equipment is equipped with an emergency stop button for situations that are beyond the user's control. The system is designed for large area production and allows easy integration with other equipment. It is highly reliable, offering high throughput and cost-effective production. One of the main advantages of using OXFORD Plasmalab uEtch unit is its advanced safety features. The etcher is equipped with fire extinguishers, plasma confinement screens and a series of filters to prevent contamination. This ensures that the machine is safe to use and minimizes any potential risk. Plasmalab uEtch is a powerful, versatile and reliable etching tool, making it ideal for the production of high quality nanoelectronic and plasmonic structures. Its high throughput and cost-effective nature makes it a viable option for researchers, developers and businesses alike.