Used OXFORD PlasmaPro 100 Cobra #293794608 for sale

OXFORD PlasmaPro 100 Cobra is a cutting-edge plasma etcher/asher equipment, designed for advanced semiconductor and microelectronic device fabrication processes. This versatile tool incorporates innovative technology to deliver high-performance plasma processing capabilities for a wide range of applications in research and development. At the core of PlasmaPro 100 Cobra is its unique dual plasma source configuration, featuring both inductively coupled plasma (ICP) and downstream plasma sources. This dual-source design provides enhanced process flexibility and control, allowing users to tailor plasma properties to meet specific process requirements. The ICP source generates a high-density plasma with efficient ionization capabilities, while the downstream plasma enhances process uniformity and stability. The system boasts a compact footprint and a user-friendly interface, making it suitable for both academic and industrial research environments. The intuitive software interface enables easy recipe development and process optimization, allowing users to quickly adapt to changing research needs. Furthermore, the unit's advanced automation capabilities streamline operation and increase productivity, minimizing downtime and maximizing throughput. OXFORD PlasmaPro 100 Cobra offers a wide range of process capabilities, including etching, ashing, surface modification, and cleaning. The machine is equipped with a range of gas delivery options, allowing for precise control of process gases and flow rates. This enables users to conduct a variety of plasma processes, such as isotropic and anisotropic etching, passivation, descumming, and resist stripping. The tool's advanced RF power capabilities enable precise control over plasma density and energy, facilitating fine-tuning of process parameters for optimal results. Additionally, the asset features a range of RF matching networks and tuning options to accommodate various substrate materials and process requirements. PlasmaPro 100 Cobra is equipped with advanced endpoint detection capabilities, allowing for real-time monitoring of process progress and ensuring precise control over etch depths and selectivity. This feature enhances process repeatability and yield, resulting in consistent and reliable device performance. In terms of model safety and reliability, OXFORD PlasmaPro 100 Cobra is engineered with robust materials and components to ensure long-term performance and operation. The equipment incorporates advanced safety interlocks and monitoring systems to prevent process deviations and ensure user protection. Overall, PlasmaPro 100 Cobra represents a cutting-edge solution for plasma processing in semiconductor and microelectronic device fabrication. With its innovative dual plasma source configuration, advanced automation capabilities, and versatile process options, this system offers unparalleled flexibility, control, and performance for a wide range of research and development applications.